MOLECULAR BEAM EPITAXIAL GROWTH AND CHARACTERIZATION OF MIXED (Ti,Nb)O2 RUTILE FILMS ON TiO2(100)
S. Chambers*, Y. Gao*, S. Thevuthasan*, Y. Liang*, N.R. Shivaparan**, R.J. Smith**
*Environmental Molecular Sciences Laboratory
Pacific Northwest National Laboratory, Richland WA 99352#
**Physics Department, Montana State University, Bozeman, MT 59717##
Epitaxial films of mixed (Nb,Ti)O2 rutile have been grown on TiO2(100) rutile at 600 C by molecular beam epitaxy. These films grow in a laminar fashion for Nb mole fractions up to ~0.10. In addition, reflection high-energy and low-energy electron diffraction, along with x-ray photoelectron diffraction and Rutherford backscattering reveal that the overlayers possess excellent long- and short-range structure order up to 10 at. %. However, strain-induced disorder becomes prevalent for higher Nb mole fractions, and the surfaces roughen and become defected accordingly. X-ray photoelectron diffraction and Rutherford backscattering reveal that Nb atoms substitutionally incorporate at cation sites in the rutile lattice for all Nb mole fractions investigated, leading to a mixed rutile Nb(x)Ti(1-x)O2 phase. Analysis of Nb 3d and Ti 2p core-level binding energies reveals that the oxidation state of both Ti and Nb is +4.
# Work supported by U.S. Department of Energy
##Work supported by NSF
J. Vac. Sci. Technol. A14(3), 1387-1394 (1996)
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