OBSERVATION OF ULTRATHIN METASTABLE FCC Ti FILMS ON Al(110) SURFACES
Adli A. Saleh, V. Shutthanandan and R.J. Smith
Physics Dept., Montana State University, Bozeman, MT 59717*
High-energy ion scattering spectroscopy (HEIS), x-ray photoemission spectroscopy (XPS)
and low-energy electron diffraction (LEED) were used to study the growth of very thin Ti films
on Al(110) surfaces at room temperature. The Al surface peak areas in the backscattering
spectra of 0.96 MeV He+ ions, incident along the [110] direction of Al(110), decreased sharply
during the deposition of the first five monolayers of Ti. This suggests a growth model in which
a pseudomorphic Ti film with an fcc structure forms, shadowing the Al surface atoms. This
model is supported by LEED measurements where sharp diffraction spots persisted with the
rectangular symmetry of the substrate lattice structure. Throughout this coverage regime, the
attenuation of the Al photopeak intensities as a function of Ti coverage agrees with the
attenuation rate calculated using a laminar growth mode. With additional Ti deposition the Al
surface peak intensities increase while the Al photopeak intensities remain unchanged. A
discussion of possible growth models for the high coverage regime is presented.
*Work supported by Montana Space Grant Consortium, NASA Grant No. GT40041, and NSF EPSCoR Grant No. RII-89211978 (MONTS)
Physical Review B49, 4908 (1994)
For information on this publication or to request a reprint send mail to smith@physics.montana.edu
Return to the Ion Beams Publication List
Return to the Ion Beams Home Page
Page Maintained by Dick Smith
Send mail to Smith@physics.montana.edu
Last Updated:17 May 1996