ROOM TEMPERATURE GROWTH OF THIN Fe FILMS ON Al (001) AND Al(110) SURFACES
N.R.Shivaparan, V.Krasemann, V.Shutthanandan*, and R.J.Smith
Physics Department, Montana State University, Bozeman, MT 59717**
The growth of thin Fe overlayers on Al(110) and Al(001) surfaces has been investigated
using high-energy ion backscattering (HEIS) and x-ray photoelectron spectroscopy (XPS) for Fe
coverages from 0 to 15 ML deposited at room temperature. For the Al(001) surface,
measurements of the backscattered ion yields from Al and Fe atoms show that the Fe atoms do
not form a simple overlayer on the Al substrate, but displace Al atoms from their equilibrium
positions to form a mixture of FeAl. The intermixing continues up to about 5 ML of Fe coverage
before Fe metal begins to cover the mixed surface. For the Al(110) surface intermixing of Fe and
Al atoms was observed up to about 9 ML of Fe deposition where Fe metal begins to cover the
surface. In neither case was Fe diffusion into the bulk Al substrate observed. XPS results show
no chemical shift larger than the resolution of our measurements for the Fe 2p core level in Fe
aluminides. The variation of the Fe XPS photopeak intensity as a function of Fe coverage also
supports the two- and three-stage growth models on Al(001) and Al(110) surfaces, respectively.
**Work supported by NSF Grant No. DMR-9409205.
Surface Science 365, 78 (1996)
* Present address:Electric Propulsion Laboratory, Department of Mechanical Engineering, Tuskegee University, Tuskegee, AL 36088, USA
For information on this publication or to request a reprint send mail to smith@physics.montana.edu
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